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EUV mirror / soft X-ray mirror

We provide multi-layer mirrors and single-layer mirrors for EUV.

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feature

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Mo/Si multilayer mirror

We provide EUV mirrors that reflect EUV light with photon energy 10 eV - 1 keV (wavelength 120 nm - 1.2 nm) with high efficiency. This energy band mirror, also called soft X-ray or XUV light, is used in a wide range of fields such as industrial applications such as EUV lithography, ultra-high-speed physical and chemical research using high-order harmonics, astrophysics applications, and soft X-ray plasma observation. It is
Multilayer film mirrors are mainly used for direct incidence, and single-layer film mirrors are mainly used for oblique incidence.

design example

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Mo/Si multilayer mirror, incident angle 0 degrees
graph
Ru single layer mirror, incident angle 80 degrees

Typical specifications

We will design the substrate shape and coating according to your request.

Typical specifications
Maximum size Diameter 3mm - 450mm
mirror shape Plane, Concave, Cylindrical, Parabolic, Spheroidal, Toroidal
multilayer material Ru/B4C, Mo/Si, Zr/AlSi, SiC/Mg, W/B4C
single layer material Ru, B4C, C, Ni, Au

Download materials

Multilayer Coating for Extreme Ultraviolet Experiments (English, white paper) (615KB)
pdf
List of related literature on EUV mirrors / soft X-ray mirrors (English) (302KB)
pdf

EUV multilayer mirror design example

This is a design example of a multilayer mirror for 20 eV - 150 eV (wavelength 60 nm - 8 nm).

Ru/B 4C multilayer mirror
(150 eV - 100 eV)

For 150 eV

Graph AOI=0 deg.
反射率: 33%, バンド幅: 1.9 eV
Graph AOI=45 deg.
反射率: 31%, バンド幅: 3.1 eV

For 120 eV

Graph AOI=0 deg.
反射率: 40%, バンド幅: 2.2 eV
Graph AOI=45 deg.
反射率: 40%, バンド幅: 4.5 eV

For 100 eV

Graph AOI=0 deg.
反射率: 41%, バンド幅: 3.3 eV
Graph AOI=45 deg.
反射率: 41%, バンド幅: 6.6 eV

Mo/Si multilayer mirror (95 eV - 70 eV)

For 90 eV

Graph AOI=0 deg.
反射率: 68%, バンド幅: 3.5 eV
Graph AOI=45 deg.
反射率: 67%, バンド幅: 6.1 eV

For 80 eV

Graph AOI=0 deg.
反射率: 61%, バンド幅: 3.1 eV
Graph AOI=45 deg.
反射率: 60%, バンド幅: 7.7 eV

Zr/AlSi multilayer mirror
(70 eV - 50 eV)

For 70 eV

Graph AOI=0 deg.
反射率: 59%, バンド幅: 2.8 eV
Graph AOI=45 deg.
反射率: 59%, バンド幅: 4.4 eV

For 60 eV

Graph AOI=0 deg.
反射率: 49%, バンド幅: 3.3 eV
Graph AOI=45 deg.
反射率: 49%, バンド幅: 6.3 eV

For 50 eV

Graph AOI=0 deg.
反射率: 32%, バンド幅: 4.9 eV
Graph AOI=45 deg.
反射率: 32%, バンド幅: 9.6 eV

SiC/Mg multilayer mirror
(45 eV - 20 eV)

For 40 eV

Graph AOI=0 deg.
反射率: 48%, バンド幅: 2.5 eV
Graph AOI=45 deg.
反射率: 48%, バンド幅: 3.0 eV

For 30 eV

Graph AOI=0 deg.
反射率: 44%, バンド幅: 3.1 eV
Graph AOI=45 deg.
反射率: 45%, バンド幅: 3.8 eV

For 20 eV

Graph AOI=0 deg.
反射率: 41%, バンド幅: 3.1 eV
Graph AOI=45 deg.
Reflectance: 46%

EUV multilayer mirror standard specifications

Standard model EUVML-(a)-(b)-(c)-(d)-(e)(f)
(a) Multilayer film material Ru/B4C, Mo/Si, Zr/AlSi, SiC/Mg
(b) Reflective type H: High Reflectivity, N: Narrowband, B: Broadband
(c) Incident angle 0 degrees - 60 degrees
(d) central energy 20 eV - 150 eV (60 nm - 8 nm)
(e) Board size 1025: 1 inch diameter x 0.25 inch thick
0525: 0.5" diameter x 0.25" thick
(f) Board type F: flat, C: concave (curvature radius 100 mm - 3000 mm)

EUV single layer film mirror design example

This is a design example of a single-layer mirror for 10 eV - 1 keV (wavelength 120 nm - 1.2 nm).

Au Mirror

Graph AOI=75 deg.
Graph AOI=85 deg.

Ni mirror

Graph AOI=75 deg.
Graph AOI=85 deg.

Ru Mirror

Graph AOI=75 deg.
Graph AOI=85 deg.

SiC mirror

Graph AOI=75 deg.
Graph AOI=85 deg.

B 4 C Mirror

Graph AOI=75 deg.
Graph AOI=85 deg.

EUV single layer mirror standard specifications

Standard model EUVSM-(a)-(b)(c)
(a) Coating material Au, Ni, Ru, B4C, SiC
(b) Substrate size 1025: 1 inch diameter x 0.25 inch thick
0525: 0.5" diameter x 0.25" thick
(c) Substrate type F: flat, C: concave (curvature radius 100 mm - 3000 mm)

Contact us

Please feel free to contact us for inquiries such as an estimate.

inquiry