EUV/X-ray optical system design and production
We design and manufacture optical systems for focusing and imaging extreme ultraviolet (EUV) and X-rays.
feature
The optical system used to focus and image EUV light and X-rays, which have shorter wavelengths than visible light, depends on the type of light source and the object to be observed. A type telescope is used.
In addition to providing these various optical systems, we also provide optical systems and elements for spectroscopy, beam forming, and beam splitting, evaluation elements, and adjustment mechanisms for various optical elements. We also offer HP Spectroscopy's EUV and soft X-ray spectrometers for use in Japan.
Production example
This is a condensing or imaging optical system that combines a direct-incidence concave mirror and a convex mirror. Each mirror is coated with a multilayer coating or a single layer coating depending on the wavelength used.
This is a condensing optical system that combines two concave mirrors with oblique incidence. Each mirror is coated with a single layer coating for total reflection that matches the wavelength used.
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We provide optical elements, adjustment mechanisms, vacuum containers, etc. according to your needs.
| Typical optical elements | |
|---|---|
| condensing element | EUV/soft X-ray mirror, hard X-ray mirror, Fresnel zone plate, toroidal mirror, condensing lens for ultraviolet light |
| spectroscopic element | EUV transmission grating, EUV dichroic mirror, soft X-ray multilayer polarizer |
| beam shaping element | X-ray center beam stop, X-ray pinhole, X-ray slit |
| beam splitting element | EUV multilayer beam splitter |
| Spectrometer/detector | EUV/X-ray spectrometer/photodetector, X-ray filter container |
Contact us
Please feel free to contact us for inquiries such as an estimate.